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#ALDALE2023
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Abstract Submission

Abstract Deadline:
May 5, 2023

Abstract Submission Guidelines

Please review the steps below before entering the online abstract submission site.

Awards: Both ALD and ALE will recognize student achievement with awards
for the best student posters and/or talks. See Awards Page

  • Step 1

    Before signing up or logging into the online system (in Step 5), please review all of the following steps to ensure you have the information needed to complete the abstract submission process.

    Please Note the Following Requirements Prior to Submission:

    1. If you are planning to submit multiple abstracts, presenters are limited to one oral and one poster presentation. One submission must be to an oral session and one to a poster session. Must be two DIFFERENT abstracts – not the same abstract submitted as both an oral and a poster
    2. All ALD/ALE 2023 oral presentations, including the question and answer period and any discussions, will be audio recorded and synchronized with your PowerPoint presentation file and compiled into conference proceedings accessible to all attendees after the meeting. The conference proceedings will also include PDF files of the poster presentations.
    3. You will need to agree to the copyright agreement.

  • Step 2

    You will be asked to select your topic. The list will be similar to the main topics listed below.

  • Step 3

    Fill out the abstract content and author details in the system (abstract 2,700 characters max. including grammar and spacing; you may also submit a supplemental 1 page PDF file containing any graphs, charts or pictures you wish to include)

  • Step 4

    Accept the copyright agreement. If you have questions e-mail della@avs.org.

STEP 5

Reopens April 4
Closes May 5

SUBMIT ABSTRACT

Author Notification

Acknowledgment that your abstract has been submitted will follow by e-mail shortly after submission. Notifications regarding acceptances will be sent by e-mail by April 4, 2023. Late news author notifications will be sent by May 15, 2023.

Tentative Topics

ALD Applications
ALD Fundamentals
ALD For Manufacturing
Area Selective Atomic Layer Deposition
Emerging Materials
Nanostructure Synthesis and Fabrication
Atomic Layer Etching Workshop
ALD Applications
  • AA1: Energy: Catalysis and Fuel Cells
  • AA2: Energy: Solar Energy Materials
  • AA3: Energy: Batteries and Energy Storage
  • AA4: Applications in ULSI FEOL: High-k
  • AA5: Applications in ULSI FEOL: Gate Electrodes & Contact Metals
  • AA6: Applications in ULSI FEOL: 3D Transistor Fabrication
  • AA7: Applications in ULSI BEOL: Interconnects, Diffusion Barriers, Low-k
  • AA8: Memory Applications: DRAM
  • AA9: Memory Applications: Flash Memory
  • AA10: Memory Applications: RRAM & Neuromorphic, MIM Capacitors
  • AA11: Memory Applications: Other Non-Volatile Memories (MRAM, FeRAM, Phase Change, …)
  • AA12: Display Applications: Thin Film Transistor, Diodes, Thin Film Encapsulation for OLEDs/QDs…
  • AA13: Emerging: Flexible/Wearable/Stretchable Applications
  • AA14: Emerging: Optics/Optoelectronics/Metamaterials/Plasmonics
  • AA15: Emerging: Medical/Healthcare/Pharmaceuticals
  • AA16: Emerging: Others (Protective Coatings, Hardness, MEMs …)
  • AA17: ALD Applications Poster Session
ALD Fundamentals
  • AF1: Precursors and Chemistry: Precursor Design, New Precursors, Process Development
  • AF2: Precursors and Chemistry: Simulation, Modeling, and Theory of ALD
  • AF3: Precursors and Chemistry: Mechanisms
  • AF4: Growth and Characterization: Surface Science of ALD
  • AF5: Growth and Characterization: High Aspect Ratio/High Surface Area/Powder ALD
  • AF6: Growth and Characterization: Plasma Enhanced ALD
  • AF7: Growth and Characterization: Low Temperature ALD
  • AF8: Growth and Characterization: In-situ Monitoring and Analysis
  • AF9: Growth and Characterization: Characterization of ALD Films
  • AF10: ALD Fundamentals Poster Session
ALD For Manufacturing
  • AM1: Equipment Design/Modeling/Large Format/Precursor Delivery
  • AM2: Spatial/R2R/Fast ALD
  • AM3: Sensing/Characterization/Process Control for High Volume
  • AM4: ALD for Manufacturing Poster Session
Area Selective Atomic Layer Deposition
  • AS1: Selective ALD by Area-Activation
  • AS2: Selective ALD by Area-Deactivation
  • AS3: Inherently Selective Processes
  • AS4: Area Selective ALD Poster Session
Emerging Materials
  • EM1: Molecular Layer Deposition
  • EM2: Organic-Inorganic Hybrid Materials
  • EM3: Atomic Layer Epitaxy and Doping
  • EM4: Magnetic Materials
  • EM5: Si-based Materials
  • EM6: Metals
  • EM7: III-V Materials
  • EM8: Nanolaminates
  • EM9: Ternary and Quaternary Materials
  • EM10: Metal Organic Frameworks
  • EM11: Emerging Materials Poster Session
Nanostructure Synthesis and Fabrication
  • NS1: Nanoparticles
  • NS2: Nanotubes, Nanowires, Nanopores
  • NS3: 2D Nanomaterials by ALD (Including Transition Metal Dichalcogenides)
  • NS4: ALD on 2D Related Materials and Devices
  • NS5: ALD on Polymer Materials
  • NS6: Nanostructures Synthesis and Fabrication Poster Session
Atomic Layer Etching Workshop
  • ALE 1: Plasma and/or Energy-enhanced ALE
  • ALE 2: Gas-phase and/or Thermal ALE
  • ALE 3: Solution-based Including Wet ALE
  • ALE 4: Materials Selective ALE, Including Area-selective ALE (Without Masks)
  • ALE 5: ALE Hardware, Diagnostics, & Instrumentation
  • ALE 6: Modeling of ALE
  • ALE 7: Atomic Layer Cleaning (ALC)
  • ALE 8: Integration of ALD + ALE
  • ALE 9: Applications for ALE
  • ALE 10: Alternative Methods to Achieve ALE or Quasi-ALE (Beam Activation, Gas/Power/Bias Pulsing, Etc.)
  • ALE11: Atomic Layer Etching Poster Session