Schedule

Technical Program

The AVS 23rd International Conference on Atomic Layer Deposition (ALD 2023) featuring the 10th International Atomic Layer Etching Workshop (ALE 2023) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, July 23-Wednesday, July 26, 2023, at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).

As in past conferences, the meeting will be preceded (Sunday, July 23) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 24-26) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.

Awards: Both ALD and ALE will recognize student achievement with awards for the best student posters and/or talks. See Awards Page

ALD Plenary Speaker

Markku Leskelä
(University of Helsinki, Finland)

ALE Plenary Speaker

Tristan Tronic
(Intel, USA)

ALD & ALE Joint Speakers

Michael Nolan (Tyndall National Institute, University College Cork, Ireland)
Greg Parsons North Carolina State University, USA)

ALD & ALE Tutorial Speakers

Lei Cheng (Argonne National Laboratory, USA)
John Ekerdt (University of Texas at Austin, USA)
Satoshi Hamaguchi (Osaka University, Japan)
Adam Hock (Illinois Institute of Technology, USA)
Se-Hun Kwon (Pusan National University, Republic of Korea)
Mari Napari (University of Southampton, UK)
Nga Phung (TU / Eindhoven, Netherlands)

ALD Invited Speakers

Chunmei Ban (University of Colorado, USA)
Mariona Coll Bau (ICMAB-CSIC, Barcelona, Spain)
Ashley Bielinski (Argonne National Laboratory, USA)
Miin-Jang Chen (National Taiwan University, Taiwan)
Anna Coclite (University of Graz, Austria)
Daire Cott (IMEC, Belgium)
Jiyoung Kim (University of Texas at Dallas, USA)
Seiyon Kim (SK Hynix, South Korea)
Masaharu Kobayashi (University of Tokyo, Japan)
Luca Lamagna (STMicroelectronics, USA)
Lisa McElwee-White (University of Florida, USA)
Charles Mokhtarzadeh (Intel, USA)
Michelle Paquette (University of Missouri Kansas City, USA)
Tania Sandoval (Technical University Federico Santa Maria, Chile)
Joachim Schnadt (Lund University, Sweden)
Xinwei Wang (Peking University, China)
Jacqueline Wrench (ASM, USA)

ALE Invited Speakers

Paul Abel (TEL, USA)
Akiko Hirata (SONY Corporation, Japan)
Xiao Hu (Chemnitz University of Technology, Germany)
Anil Mane (Argonne National Lab, USA)
Austin Minnich (Caltech, USA)
Kazunori Shinoda (Hitachi, Japan)
Thomas Tillocher (Universite d’Orleans, France)